该设备为微波等离子化学气相沉积系统（MWCVD）。采用915MHz频率的微波源激发稳定的等离子体。该设备可以稳定生长金刚石单晶材料、多晶晶圆。通过工艺调节，可以稳定生长出 4 英寸（~6英寸）的金刚石晶圆薄膜。

The device is a microwave plasma chemical vapor deposition system (MWCVD). The stable plasma is excited by a microwave source with a frequency of 915MHz. The equipment can stably grow diamond monocrystalline materials and polycrystalline wafers. Through process adjustment, 4 inches (~6 inches) of adamantine wafer film can be steadily grown.